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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- Korean Society for Precision Engineering Journal of the Korean Society for Precision Engineering 한국정밀공학회지 Vol.28 No.3
- 발행연도
- 2011.3
- 수록면
- 383 - 388 (6page)
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초록· 키워드
오류제보하기
The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 ㎃/㎠ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.
목차
1. 서론
2. 이온소스 제작
3. 이온소스의 특성
4. 이온빔 포커싱 특성
5. 결론
후기
참고문헌
참고문헌 (12)
참고문헌 신청
Okazaki,S / 1989 / Comparison of Optical,X-ray,Electron,and ion beam Lithography / Microelectronics Engineering 9(1):297~304
Gierak, J / 2001 / Nano-fabrication withfocused ion beams / Microelectronic Engineering 57:865~875
Choi, Y. S. / 2009 / Evaluation of durability and etching rate of materialof the Multi-aperture plate for Multi-FIB / Proc. ofKSPE Spring Conference :929~930
Bruenger, W. H. / 2001 / Status of Ion Projection Lithography / Proc. of Mat. Res. Soc. Symp
Jiang, X. Q. / 2003 / Mini rfdrivenion sources for focused ion beam systems / Rev. Sci. Instrum 74(4):2288~2292
Gierak, J / 2001 / Nano-fabrication withfocused ion beams / Microelectronic Engineering 57:865~875
Choi, Y. S. / 2009 / Evaluation of durability and etching rate of materialof the Multi-aperture plate for Multi-FIB / Proc. ofKSPE Spring Conference :929~930
Bruenger, W. H. / 2001 / Status of Ion Projection Lithography / Proc. of Mat. Res. Soc. Symp
Jiang, X. Q. / 2003 / Mini rfdrivenion sources for focused ion beam systems / Rev. Sci. Instrum 74(4):2288~2292
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UCI(KEPA) : I410-ECN-0101-2012-555-004357069