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자료유형
학술저널
저자정보
Shweta Tripathi (Banaras Hindu University) S. Jit (Banaras Hindu University)
저널정보
대한전자공학회 JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE Journal of Semiconductor Technology and Science Vol.11 No.1
발행연도
2011.3
수록면
40 - 50 (11page)

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초록· 키워드

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A two-dimensional (2D) analytical model for the potential distribution and threshold voltage of short-channel ion-implanted GaAs MESFETs operating in the sub-threshold regime has been presented. A double-integrable Gaussian-like function has been assumed as the doping distribution profile in the vertical direction of the channel. The Schottky gate has been assumed to be semi-transparent through which optical radiation is coupled into the device. The 2D potential distribution in the channel of the shortchannel device has been obtained by solving the 2D Poisson’s equation by using suitable boundary conditions. The effects of excess carrier generation due to the incident optical radiation in channel region have been included in the Poisson’s equation to study the optical effects on the device. The potential function has been utilized to model the threshold voltage of the device under dark and illuminated conditions. The proposed model has been verified by comparing the theoretically predicted results with simulated data obtained by using the commercially available ATLAS™ 2D device simulator.

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Abstract
Ⅰ. INTRODUCTION
Ⅱ. DEVICE DETAILS
Ⅲ. THEORETICAL MODEL
Ⅳ. OUTLINE OF ATLAS™ SIMULATION
Ⅴ. RESULTS AND DISCUSSION
Ⅵ. CONCLUSIONS
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UCI(KEPA) : I410-ECN-0101-2013-569-000588355