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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2011.10
- 수록면
- 1,895 - 1,902 (8page)
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This work was carried out for the measurement of vibration and rotation temperature using the optical emission spectroscopy of nitrogen second positive system in the small plasma torch. Among emissions N2 SP systems, the emission of N2 SP(0-0) was so strong. Emission peaks of SP system increased until the position of 12.5[mm] from the end of plasma torch, after that it decreased. However, vibration temperature decreased from 1540[K] to 1000[K] at the position of 12.5[mm]. In addition, rotational temperature was about 400[K] at the position of 10[mm] and it increased a little as much of 420[K] at 12.5[mm]. Consequently, the plasma torch discussed in this work is possible to apply in the surface treatment process under the low temperature.
목차
Abstract
1. 서론
2. 플라즈마 발광이론과 현상
3. 실험장치의 구성 및 분광분석 이론
4. 실험결과 및 분석
5. 결론
감사의 글
참고문헌
저자소개
참고문헌 (15)
참고문헌 신청
Francis F. Chen / Principles of Plasma Processing / Univ. of California, book
P Peze / 1993 / Quantitative measurements of oxygen atom density using LIF / J. Phys. D: Appl. Phys 26:1622~1629
S De Benedictis / 1997 / The NO(A) excitation mechanism in a N2-O2 pulsed RF discharge / J. Phys. D:Appl. Phys 30:2887~2894
Ryo Ono / 2002 / NO formation in a pulsed spark discharge in N2/O2/Ar mixture at atmospheric pressure / J. Phys. D:Appl. Phys 35:543~548
A Broc / 2004 / LIF investigations on NO, O and N in a supersonic N₂/ O₂/ NO RF plasma jet / Plasma sources sci. Technol 13:504~514
P Peze / 1993 / Quantitative measurements of oxygen atom density using LIF / J. Phys. D: Appl. Phys 26:1622~1629
S De Benedictis / 1997 / The NO(A) excitation mechanism in a N2-O2 pulsed RF discharge / J. Phys. D:Appl. Phys 30:2887~2894
Ryo Ono / 2002 / NO formation in a pulsed spark discharge in N2/O2/Ar mixture at atmospheric pressure / J. Phys. D:Appl. Phys 35:543~548
A Broc / 2004 / LIF investigations on NO, O and N in a supersonic N₂/ O₂/ NO RF plasma jet / Plasma sources sci. Technol 13:504~514
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UCI(KEPA) : I410-ECN-0101-2013-560-000731475