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지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 발행연도
- 2012.11
- 수록면
- 1,646 - 1,653 (8page)
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초록· 키워드
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More attentions have been paid on non-contact handling approaches in the field of semiconductor production process, especially the application in wafer. Since the contact handling always leads to damaging and contaminating of the products, it is highly desirable to get effective non-contact handling for improvement of the product quality. The pneumatic levitation is based upon Bernoulli principle. However, this method is known to consume large gas flow rate which can rise the cost of products. Moreover, the recent trend of wafer is increasing its size so that more power is required to lift up and transport the wafer. In this case, the gas flow rate should be increased and the compressible effects of gas may be of practical importance. In the present paper, a computational fluid dynamics method has been used to get insight into the Bernoulli levitation. A circular plate of work piece was employed as a model of wafer. The 3-dimensional compressible Navier-Stokes equations furnished with the SST k-ω turbulence model were solved using a fully implicit finite volume scheme. Gas flow rate, diameter of work piece and the clearance gap between work piece and circular cylinder were varied to investigate the flow characteristics inside. The levitation force was analyzed in terms of gas flow rate and clearance gap. It is known that there is an optimal clearance gap for the lifting force and increasing the supply gas flow rate results in a larger lifting force.
목차
Abstract
1. 서론
2. 이론해석
3. 수치해석 방법
4. 결과 및 고찰
5. 결론
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UCI(KEPA) : I410-ECN-0101-2014-550-000190394