지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 발행연도
- 2012.10
- 수록면
- 1,275 - 1,278 (4page)
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초록· 키워드
오류제보하기
currently, many different defect detection algorithms have developed. Most finds defect using optical method, and some using image processing uses a reference image. There are several problems using the reference image. The scale, illumination or orientation difference between the reference and the target image make it hard or even impossible to find defect by comparison. Also, there might not be a reference image existed from first place. In this paper, we present a method that automatically find and analyze the defects from an aerial image obtained from a commercial mask inspection device, Aerial Image Measurement System (AIMS). By using this, we developed the process create a reference image from the test image with defect, compare the test image with reference image, and find the exact defect position. Our system finds the defect fully automatically in a short time with high accuracy.
목차
Abstract
1. INTRODUCTION
2. PROPERTIES OF AERIAL IMAGES
3. PREPROCESSING
4. DEFECT DETECTION
5. CD MEASUREMENT
6. EXPERIMENTAL RESULT
7. CONCLUSION
REFERENCES
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