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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2013.6
- 수록면
- 155 - 158 (4page)
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초록· 키워드
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FeCoB films were being prepared on a Ru underlayer by using the oblique incidence of sputtered and backscattered particles which have a high in-plane magnetic anisotropy field H<SUB>k</SUB> above 400 Oe. It is suitable to attain such deposition condition when facing targets sputtering system. The in-plane X-ray diffraction analysis clarified that there is anisotropic residual stress which is the origin of the high in-plane magnetic anisotropy. The directional crystalline alignment and inclination of crystallite growth were also observed. Such anisotropic crystalline structures may affect the anisotropic residual stress in the films. The B content of 5.6 at.% was appropriate to induce such anisotropic residual stress and H<SUB>k</SUB> of 410 Oe in this experiment. The film with B content of 6 at.% possessed large saturation magnetization of 22 kG and high H<SUB>k</SUB> of 500 Oe. The film exhibited high ferromagnetic resonance frequency of 9.2 GHz.
목차
1. Introduction
2. Experimental
3. Result and Discussion
4. Conclusion
References
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UCI(KEPA) : I410-ECN-0101-2014-420-002486972