지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
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This study introduces metal coating as an effective sample preparation method to remove charge-up caused by the shadow effect during f eld emission scanning electron microscope (FE-SEM) analysis of dynamic structured samples. During a FE-SEM analysis, charge-up occurs when the primary electrons (input electrons) that scan the specimens are not equal to the output electrons (secondary electrons, backscattered electrons, auger electrons, etc.) generated from the specimens. To remove charge-up, a metal layer of Pt, Au or Pd is applied on the surface of the sample. However, in some cases, charge-up still occurs due to the shadow effect. This study developed a coating method that effectively removes charge-up. By creating a converted sample stage capable of simultaneous tilt and rotation, the shadow effect was successfully removed, and image data without charge-up were obtained.
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참고문헌 (10)
참고문헌 신청
Clay C S / 2011 / Ion beam sputtering: an improved method of metal coating SEM samples and shadowing CTEM samples / J. Microsc 123 : 25 ~ 34
Egerton R F / 2004 / Radiation damage in the TEM and SEM / Micron 35 : 399 ~ 409
Hirsh P / 1994 / Contamination in a scanning electron microscope and the influence of specimen cooling / Scanning 16 : 101 ~ 110
Kemmenoe B H / 1983 / Structure analysis of sputtercoated and ion-beam sputter-coated films: a comparative study / J. Microsc 132 : 153 ~ 163
Kim K H / 2010 / Charging effects on SEM/SIM contrast of metal/insulator system in various metallic coating conditions / Mater. Trans 51 : 1080 ~ 1083
Egerton R F / 2004 / Radiation damage in the TEM and SEM / Micron 35 : 399 ~ 409
Hirsh P / 1994 / Contamination in a scanning electron microscope and the influence of specimen cooling / Scanning 16 : 101 ~ 110
Kemmenoe B H / 1983 / Structure analysis of sputtercoated and ion-beam sputter-coated films: a comparative study / J. Microsc 132 : 153 ~ 163
Kim K H / 2010 / Charging effects on SEM/SIM contrast of metal/insulator system in various metallic coating conditions / Mater. Trans 51 : 1080 ~ 1083
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