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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Journal of Korean Vacuum Science & Technology Journal of Korean Vacuum Science & Technology Vol.3 No.1
- 발행연도
- 1999.4
- 수록면
- 43 - 48 (6page)
이용수
초록· 키워드
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Using microwave plasma-enhanced chemical vapor deposition, diamond films were successfully grown on Ti-coated glass substrates at temperatures as low as around 500℃ in behalf of practical applications to field emitters. Electron emission was observed at turn-on fields below 18 V/㎛. Field emission characteristics of diamond films were discussed in terms of their crystalline qualities. Diamond films with poorer crystalline qualities showed better field emission properties.
목차
Abstract
Ⅰ. Introduction
Ⅱ. Experimental
Ⅲ. Results and Discussion
Ⅳ. Conclusion
Acknowledgement
References
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