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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 1994.6
- 수록면
- 147 - 157 (11page)
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초록· 키워드
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Valence or core electron excitations induced by Synchrotron radiation (SR) irradiation and ensuing chemical reactions can be applied for semiconductor processes, i,e., deposition, etching, and modifications of thin film materials. Unique selectivity can be achieved by this photochemical reactions in deposition and etching. Some materials can be evaporated by SR irradiation, which can be utilized for low temperature surface cleaning of thin films. Also SR irradiation significantly lowers the reaction temperature and photon activated surface reactions can be utilized for direct writing or projection lithography of electronic materials. This technique is especially effective in making nanoscale feature size with abrupt and well defined interfaces for next generation electronic devices.
목차
Abstract
1. Introduction
2. Experimental Setup
3. SR - Excited Chemical Vapor Vapor Deposition
4. Etching
5. Evaporation and Surface Modification
Acknowledgements
References
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