메뉴 건너뛰기
.. 내서재 .. 알림
소속 기관/학교 인증
인증하면 논문, 학술자료 등을  무료로 열람할 수 있어요.
한국대학교, 누리자동차, 시립도서관 등 나의 기관을 확인해보세요
(국내 대학 90% 이상 구독 중)
로그인 회원가입 고객센터 ENG
주제분류

추천
검색

논문 기본 정보

자료유형
학술저널
저자정보
Kim, D.W. (Department of Metallurgical Engineering, Yonsei University) Park, H.S. (Department of Metallurgical Engineering, Yonsei University) Kwak, J.S. (Department of Metallurgical Engineering, Yonsei University) Lee, S.M. (Department of Metallurgical Engineering, Kangwoen University) Baik, H.K. (Department of Metallurgical Engineering, Yonsei University)
저널정보
한국재료학회 Fabrication and Characterization of Advanced Materials Fabrication and Characterization of Advanced Materials 제2권 제2호
발행연도
1995.1
수록면
875 - 880 (6page)

이용수

표지
📌
연구주제
📖
연구배경
🔬
연구방법
🏆
연구결과
AI에게 요청하기
추천
검색

초록· 키워드

오류제보하기
As a fundamental study to develop ohmic contact material and process, Ge/Ni/ZnSe interfacial reaction and electrical property would be investigated. After annelaing at $170^{\circ}C$ for 10min, NiGe was the first phase in the Ge/Ni interface and fine $Ni_3Se_2$ phase was observed at the Ni/ZnSe interface. As Ni reacted with Ge, Ni was deficient in Ge/Ni interface and no more interfacial reaction could occurred. In order to evaluate Schottky barrier height of Ge/Ni/p-ZnSe diode, C-V measurements were carried out for Ge/Ni diodes before and after annealing at temperature ranged form $130^{\circ}C$ to $410^{\circ}C$ for 10 minute under $N_2$ atmosphere. The Schottky barrier height was 1.3eV at as-deposited state and it decreased rapidly to 0.44eV after annealing at $170^{\circ}C$. Considering interfacial reaction, we can conculde that the reaction phase at Ni/ZnSe interface lowered Schottky barrier height.

목차

등록된 정보가 없습니다.

참고문헌 (0)

참고문헌 신청

함께 읽어보면 좋을 논문

논문 유사도에 따라 DBpia 가 추천하는 논문입니다. 함께 보면 좋을 연관 논문을 확인해보세요!

이 논문의 저자 정보

최근 본 자료

전체보기

댓글(0)

0