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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국광과학회 Journal of photoscience : an international journal officail organ of the korean society of photoscience Journal of photoscience : an international journal officail organ of the korean society of photoscience 제10권 제1호
- 발행연도
- 2003.1
- 수록면
- 97 - 104 (8page)
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초록· 키워드
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The excitation wavelength dependence of laser ablation dynamics of an azobenzene-containing urethane-urea copolymer film was investigated by measuring the laser fluence dependence of etch depth, transient absorbance change at each excitation wavelength, and transient absorption spectra. Moreover expansion/contraction dynamics was studied by applying nanosecond time-resolved interferometry. The threshold was determined at several excitation wavelengths from etch depth measurement, while time-integrated absorbance was obtained under excitation conditions. The photon energy required to remove the topmost of surface layer of the film did not .depend on excitation wavelength, and the penetration depth of excitation pulse dominated the etch depth. When the excitation wavelength was longer than 500 nm, permanent swelling was clearly observed but not for shorter wavelength excitation. In the latter case, photoisomerization occurred during excitation and the following photoreduction may play an important role. On the basis of the observations made in this study, a photochemical and photothermal mechanisms can explain mostly the short and long wavelength excitation results, respectively.
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