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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.29 No.6
- 발행연도
- 2020.11
- 수록면
- 186 - 189 (4page)
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초록· 키워드
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The effect of sputtering parameters on molybdenum disulfide (MoS₂) films synthesized by radio frequency (RF) magnetron sputtering and electron-beam irradiation (EBI) was examined. Raman spectroscopy and atomic force microscopy were performed to investigate the structural properties of synthesized MoS₂ films. The crystallinity of as-deposited MoS₂ films increased with RF power, and the number of atomic layers of EBI-treated MoS₂ films decreased as working distance and pressure increased. In addition, the atomic rearrangement and the change in surface morphology induced by EBI treatment were confirmed. Finally, the layered structure of EBI-treated MoS₂ films was investigated through transmission electron microscopy. As sputtering parameters play an important role in the synthesis of MoS₂ films, this report will contribute to the large-area fabrication of MoS₂ films in future.
목차
ABSTRACT
1. Introduction
2. Experimental details
3. Results and discussion
4. Conclusions
References
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