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Subject

Plasma etching of Boron-Doped Diamond with RF plasma
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논문 기본 정보

Type
Proceeding
Author
Ryuhei UEDA (Chiba Institute of Technology) Takumi KAMESHIMA (Chiba Institute of Technology) Yukihiro SAKAMOTO (Chiba Institute of Technology)
Journal
The Korean Institute of Surface Engineering 한국표면공학회 학술발표회 초록집 한국표면공학회 ICSE 2023
Published
2023.11
Pages
303 - 303 (1page)

Usage

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Topic
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Method
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Result
Plasma etching of Boron-Doped Diamond with RF plasma
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