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논문 기본 정보

자료유형
학위논문
저자정보

김종현 (포항공과대학교, 포항공과대학교 일반대학원)

지도교수
임근배
발행연도
2014
저작권
포항공과대학교 논문은 저작권에 의해 보호받습니다.

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이 논문의 연구 히스토리 (4)

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A great amount of research has been devoted to the fabrication of micrometer or nano-size patterns and structures. Ultra-precision patterning technologies have been extended to numerous applications such as mechanical components, sensors as well as optical and electronic devices. There is also a hard-X-ray-based lithography technology that utilizes synchrotron-radiated ultra-short-wavelength X-rays. Such a process is useful for manufacturing high-aspect-ratio microstructures, given the good collimation property and high intensity of synchrotron-based X-rays.
X-ray-based lithography has a drawback with respect to the fabrication of multi-layered structures: specifically, the difficulty of the alignment process, due to the opaque property of the X-ray mask. It is for this reason that hard-X-ray lithography has been applied mainly to mono-layered microstructures. Another drawback of hard-X-ray lithography is the difficulty of the demolding process when precise structures fabricated by X-ray lithography and the subsequent electroforming process are utilized as mold inserts for the purposes of mass production. There are also other drawbacks to this X-ray process as an ultra-precision patterning technique for realization of sub-micron or nano-scale structures due to the difficulty of fabricating a precise X-ray mask. In the present dissertation, novel technologies for fabricating micro- and nano-scale structures by overcoming afore-mentioned difficulties were proposed and developed.
In term of novel microstructures, two types of novel technology developed for fabrication of multi-layered microstructures are proposed. One, vertically modularized micro-mold systems, and the other, hybrid machining based on the combination of the conventional micro-milling process and hard-X-ray lithography. The proposed technologies could overcome the pattern-accuracy limitation of conventional machining as well as the pattern-flexibility drawback of the X-ray process. Their respective utilities were demonstrated through fabrication of various multi-layered structures of tens of microns lateral size and millimeter-range height. In addition, in order to overcome the difficulty encountered in the demolding process when X-ray-based microstructures are utilized as mold inserts for mass production, proposed sacrificial polymer-based mold inserts were tested. These mold inserts proved controllable in their mechanical hardness and chemical solubility by introduction of unique second X-ray irradiation. With such sacrificial inserts, powder-injection molding could be used to achieve ceramic-based microstructures with an aspect ratio of 5 and a lateral size of about 40~50 μm, which are difficult to realize by other machining or lithography technologies.
In order to fabricate sub-micron- or nano-size patterns, two types of technique were developed. The first is based on precise stage movement and utilization of a micron-scale X-ray mask. Ultra-long channels or structures of about 500 nm scale were realized without the aid of advanced lithography for fabrication of X-ray masks such as electron-beam writing or ion-beam lithography. The second technique proceeds via the fabrication of a nano-X-ray mask using typical UV lithography and metal deposition to sidewalls. Then, a novel multi-scale fabrication technique utilizing multiple X-ray irradiations or multiple X-ray masks was developed for fabrication of various micro- and nanostructures. This technique is a cost-effective means of achieving ultra-precision structures that are difficult to realize using typical UV lithography. Also, high-aspect-ratio or oblique-shape sub-micron or nanostructures were demonstrated. According to the easy realization of nano-channels by the proposed techniques, a feasibility study on the application of nanofluidics also was carried out.
It should be noted that all of the proposed techniques offer, additionally to their micro- and nano-structural fabrication performances, simplicity and ease of use, which attributes provide further evidence of their great utility as precision manufacturing technologies

목차

1. Introduction 1
1.1 Overview 1
1.2 Previous Works 3
1.2.1 Micro manufacturing technologies 3
1.2.2 Nano lithography technologies 6
1.3 Objective and Organization of Dissertation 11
2. Hard X-ray lithography process 15
2.1 Introduction 15
2.2 Hard X-ray lithography process 17
2.2.1 Overview of X-ray based process 17
2.2.2 Synchrotron Radiation 22
2.2.3 X-ray mask for a selective X-ray irradiations 30
2.2.4 Photoresists for X-ray lithography 37
2.2.5 X-ray irradiation and Development process 39
2.3 Description of Experiment Setup 41
2.3.1 PLS 9D Beamline 41
2.3.2 Mirror system for high energy cut-off 46
2.3.3 Scanner chamber and Motorized stages 48
3. Microstructures : Multi-layered structures via v-MSMS 52
3.1 Motivation 52
3.2 Concept of v-MSMS 54
3.3 Design and Experiment 56
3.3.1.Design and Prepartation of X-ray mask 56
3.3.2 Irradiation of X-ray and metal electroforming 57
3.4 Result and Discussion 60
3.5 Summary 62
4. Microstructures : Multi-leveled structures via Hybrid machining 64
4.1 Motivation 64
4.2 Concept of Hybrid machining 66
4.3 Design and Experiment 67
4.3.1.Design and fabrication of X-ray mask 67
4.3.2 Substrate preparation 69
4.3.3 X-ray irradiation and develoment 70
4.4 Result and Discussion 73
4.5 Summary 78
5. Microstructures : Sacrificial mold inserts for PIM process 80
5.1 Motivation 80
5.2 Concept of v-MSMS 82
5.3 Design and Experiment 85
5.3.1.X-ray process for sacrificial mold inserts 85
5.3.2 Powder injection molding process using sacrificial mold inserts 89
5.4 Result and Discussion 90
5.5 Summary 91
6. Nanostructures : X-ray Double patterning 92
6.1 Motivation 92
6.2 Concept of Fabrication vis ultira-precision stages 94
6.3 Experiment 96
6.3.1.Fabrication of X-ray mask 96
6.3.2 Setup of precision-stage-based X-ray irradiation system 98
6.3.3 X-ray irradiation 100
6.4 Result and Discussion 101
6.5 Summary 105
7. Nanostructures : UV based nano X-ray mask and Multiple X-ray process 107
7.1 Motivation 107
7.2 Concept of nano X-ray mask and multiple X-ray process 110
7.3 Experiment 114
7.3.1.Fabrication of X-ray masks 114
7.3.2 Experiments using hard X-ray process 116
7.4 Result and Discussion 117
7.5 Summary 123
8. Improvements and Application of the proposed technology 124
8.1 Motivation 124
8.2 Fabrication of HAR-structures 125
8.3 Fabrication of oblique-structures 131
8.4 Fabrication of long nanochannels for fluidic applications 135
9. Concluding Remarks and Future Works 139
9.1 Concluding Remarks 139
9.2 Future Works 142
References 144
Summary in Korean 160

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