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논문 기본 정보
- 자료유형
- 학위논문
- 저자정보
- 지도교수
- Du Yeol Ryu
- 발행연도
- 2015
- 저작권
- 연세대학교 논문은 저작권에 의해 보호받습니다.
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The ordering and orientation of lamellar microdomains in the thin films of a high-molecular-weight polystyrene-b-poly(methyl methacrylate)(PS-b-PMMA) were investigated, where the films on random copolymer-grafted substrate were solvent annealed with a neutral solvent in temperature gap system. The temperature gap system is that the bottom of the chamber was preheated at 23, 25 and 30°C and simultaneously the ambient temperature was maintained at 20°C.
A symmetric PS-b-PMMA was synthesized by the sequential, anionic polymerization of styrene and methyl methacrylate in tetrahydrofuran (THF). A P(S-r-MMA)-grafted substrate was used for surface neutrality to the PS and PMMA blocks. The surface modification by grafting reaction at the substrate was accomplished by thermal annealing the thin films of end-functionalized P(S-r-MMA) on Si wafer.
In this study, temperature gap system was demonstrated that diblock copolymer used PS-b-PMMA develop to long range order and stability of lamellar microdomains in BCP films on a variety of swelling ratio using a solvent vapor annealing process with tetrahydrofuran (THF) that is a neutral solvent for the two blocks of PS-b-PMMA.
The films were characterized using scanning force microscopy (SFM), field emission scanning electron microscope (FESEM) and grazing incidence small-angle X-ray scattering (GISAXS).
A symmetric PS-b-PMMA was synthesized by the sequential, anionic polymerization of styrene and methyl methacrylate in tetrahydrofuran (THF). A P(S-r-MMA)-grafted substrate was used for surface neutrality to the PS and PMMA blocks. The surface modification by grafting reaction at the substrate was accomplished by thermal annealing the thin films of end-functionalized P(S-r-MMA) on Si wafer.
In this study, temperature gap system was demonstrated that diblock copolymer used PS-b-PMMA develop to long range order and stability of lamellar microdomains in BCP films on a variety of swelling ratio using a solvent vapor annealing process with tetrahydrofuran (THF) that is a neutral solvent for the two blocks of PS-b-PMMA.
The films were characterized using scanning force microscopy (SFM), field emission scanning electron microscope (FESEM) and grazing incidence small-angle X-ray scattering (GISAXS).
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