목차

I. 서론 ·································································································································1
II. 관련이론 ·······················································································································2
2.1. Plasma ·······················································································································2
2.1.1. Plasma 정의········································································································2
2.1.2. Plasma 변수········································································································3
2.1.3. Plasma 소스······································································································23
2.2. Plasma 진단 기술·································································································30
2.2.1. 단일 랑뮤어 탐침법 ·························································································31
2.2.2. 이중 랑뮤어 탐침법 ·························································································36
2.2.3. 플라즈마 진동 주파수 탐침법 ·······································································38
2.2.4. 컷오프 탐침법 ···································································································40
2.2.5. 발광분광분석법 ·································································································42
2.2.6. 사중극자질량분석기 ·························································································43
2.3. 캐패시턴스 측정법을 이용한 웨이퍼형 센서 시스템 ······································47
2.3.1 측정 시스템 장치 구성 ····················································································47
2.3.2 측정 시스템 원리 ······························································································49
III. 실험 ···························································································································53
3.1. 연구 목적 및 필요성····························································································53
3.2. 측정 조건 및 결과 ································································································55
3.2.1. 인가 전력과 압력에 따른 실험
(플라즈마 주파수 프로브 + 단일 랑뮤어 탐침 + 웨이퍼 센서) ············ 56
3.2.2. 플라즈마 균일도 실험
(단일, 이중 랑뮤어 탐침 + 웨이퍼 센서) ····················································75
3.2.3. 웨이퍼 센서 유무에 따른 실험
(단일 랑뮤어 탐침 + 웨이퍼 센서 +발광분광법 +사중극자질량분석기) ··· 79
3.2.4. 인가 전력에 따른 실험
(컷오프 탐침 + 웨이퍼 센서) ·········································································86
3.2.5. 안테나(Antenna)와 척(Chuck) 간의 거리에 따른 실험
(컷오프 탐침 + 웨이퍼 센서) ·········································································92
IV. 결론 ···························································································································97
V. 참고 문헌 ··················································································································99