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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- Korean Society for Precision Engineering International Journal of Precision Engineering and Manufacturing International Journal of Precision Engineering and Manufacturing Vol.9 No.2
- 발행연도
- 2008.4
- 수록면
- 18 - 22 (5page)
이용수
초록· 키워드
오류제보하기
The pitch and orthogonality of two-dimensional (2-D) gratings were measured using a metrological atomic force microscope (MAFM), and the measurement uncertainty was analyzed. Gratings are typical standard devices for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2-D gratings, it is important to certify the pitch and orthogonality of such gratings accurately for nanometrology. In the measurement of 2-D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme is required to overcome limitations such as thermal drift and slow scan speed. Two types of 2-D gratings with nominal pitches of 300 and 1000 ㎚ were measured using line scans to determine the pitch measurement in each direction. The expanded uncertainties (k = 2) of the measured pitch values were less than 0.2 and 0.4 ㎚ for each specimen, and the measured orthogonality values were less than 0.09° and 0.05°, respectively. The experimental results measured using the MAFM and optical diffractometer agreed closely within the expanded uncertainty of the MAFM. We also propose an additional scheme for measuring 2-D gratings to increase the accuracy of calculated peak positions, which will be the subject of future study.
목차
1. Introduction
2. Instrument and Procedures
3. Uncertainty Analysis
4. Experiments
5. Conclusions
REFERENCES
참고문헌 (11)
참고문헌 신청
1. [학술지(정기간행물)] - Teague,E.C / 1991 / Nanometrology / Proc. AIP Conference on Scanned Probe Microscopy 241 : 371 ~ 407
2. [단행본] - Carneiro,K / 2001 / The need for metrology in nanotechnology / Danish Institute of Fundamental Metrology : 1 ~ 5
3. [학술지(정기간행물)] - Postek, M. T / 1993 / Interlaboratory study on the lithographically produced scanning electron microscope magnification standard prototype / Journal of Research of the National Institute of Standards and Technology 98 (4) : 447 ~ 467
4. [학술지(정기간행물)] - Nakayama, Y / 1988 / Proposal for a new submicron dimension reference for an e-beam metrology system / Journal of Vacuum Science and Technology B 6 (6) : 1930 ~ 1933
5. [학술대회논문] - Meli, F / 1999 / High precision pitch calibration of gratings using laser diffractometry / First International Conference and General Meeting of the Euspen Society for Precision Engineering and Nanometrology : 252 ~ 255
2. [단행본] - Carneiro,K / 2001 / The need for metrology in nanotechnology / Danish Institute of Fundamental Metrology : 1 ~ 5
3. [학술지(정기간행물)] - Postek, M. T / 1993 / Interlaboratory study on the lithographically produced scanning electron microscope magnification standard prototype / Journal of Research of the National Institute of Standards and Technology 98 (4) : 447 ~ 467
4. [학술지(정기간행물)] - Nakayama, Y / 1988 / Proposal for a new submicron dimension reference for an e-beam metrology system / Journal of Vacuum Science and Technology B 6 (6) : 1930 ~ 1933
5. [학술대회논문] - Meli, F / 1999 / High precision pitch calibration of gratings using laser diffractometry / First International Conference and General Meeting of the Euspen Society for Precision Engineering and Nanometrology : 252 ~ 255
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