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Studies on Wet Etching of PHEMT with Citric acid based solutions
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Citric acid 조성 비율에 따른 식각 특성에 관한 연구

논문 기본 정보

Type
Proceeding
Author
Journal
The Institute of Electronics and Information Engineers 대한전자공학회 학술대회 대한전자공학회 종합 학술 대회 논문집 (하계) 2001, Vol.2 : 반도체 소사이어티 Vol.24 No.1
Published
2001.6
Pages
33 - 36 (4page)

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Studies on Wet Etching of PHEMT with Citric acid based solutions
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Contents

Abstract
Ⅰ. 서론
Ⅱ. 식각 용액의 구성
Ⅲ. 구성 요소 조성비에 따른 식각 특성
Ⅳ. 소자 제작에 적용 가능한 리세스 식각 용액
Ⅴ. 결론
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