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논문 기본 정보
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- 한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제9권 제1호
- 발행연도
- 2008.1
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- 1 - 5 (5page)
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ZnS is an attractive material for future optical and electrical devices since it has a direct and wide band gap to provide blue emission at room temperature. In this study, inductively coupled BCl3/Ar plasma was used to etch ZnS:Mn thin films. The maximum etch rate of 164.2 nm/min for ZnS:Mn was obtained at a BCl₃(20)/Ar(80) gas mixing ratio, an rf power of 700 W, a dc bias voltage of -200 V, a total gas flow of 20 sccm, and a chamber pressure of 1 Pa. The etch behaviors of ZnS:Mn thin films under various plasma parameters showed that the ZnS:Mn were effectively removed by the chemically assisted physical etching mechanism. The surface reaction of the ZnS:Mn thin films was investigated by X-ray photoelectron spectroscopy. The XPS analysis revealed that Mn had detected on the surface ZnS:Mn etched in BCl₃/Ar plasma.
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참고문헌 (14)
참고문헌 신청
C.W. Chung / 1998 / Reactive ion etching of Pb(ZrxTi1 ? x)O₃ thin films in an inductively coupled plasma / J. Vac. Sci. Technol. A 16 (4) : 1894 ~
D.P. Kim / 2004 / Etching properties of ZnS thin films in Cl2/CF4/Ar plasma / Thin Solid Films 459 (1-2) : 131 ~
F.A. Khan / 1999 / High rate etching of SiC using inductively-coupled-plasma reactive ion etching in SF6-based gas mixtures / Appl. Phys. Lett 75 (15) : 2268 ~
G.J. Orloff / 1992 / Hydrogen based reactive ion etching of zinc sulfide / J. Vac. Sci. Technol. A 10 (4) : 1371 ~
G.J. Orloff / 1992 / Optical emission spectroscopy of zinc sulfide etch / J. Vac. Sci. Technol. A 10 (5) : 3065 ~
D.P. Kim / 2004 / Etching properties of ZnS thin films in Cl2/CF4/Ar plasma / Thin Solid Films 459 (1-2) : 131 ~
F.A. Khan / 1999 / High rate etching of SiC using inductively-coupled-plasma reactive ion etching in SF6-based gas mixtures / Appl. Phys. Lett 75 (15) : 2268 ~
G.J. Orloff / 1992 / Hydrogen based reactive ion etching of zinc sulfide / J. Vac. Sci. Technol. A 10 (4) : 1371 ~
G.J. Orloff / 1992 / Optical emission spectroscopy of zinc sulfide etch / J. Vac. Sci. Technol. A 10 (5) : 3065 ~
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