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Nanoparticles Synthesis and Modification using Solution Plasma Process
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Type
Academic journal
Author
Mu Kyeom Mun (Sungkyunkwan University) Won Oh Lee (Sungkyunkwan University) Jin Woo Park (Sungkyunkwan University) Doo San Kim (Sungkyunkwan University) Geun Young Yeom (Sungkyunkwan University) Dong Woo Kim (Sungkyunkwan University)
Journal
The Korean Vacuum Society Applied Science and Convergence Technology Vol.26 No.6 KCI Excellent Accredited Journal SCOPUS
Published
2017.11
Pages
164 - 173 (10page)

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Nanoparticles Synthesis and Modification using Solution Plasma Process
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Abstract· Keywords

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Across the most industry, the demand for nanoparticles is increasing. Therefore, many studies have been carried out to synthesize nanoparticles using various methods. The aim of this paper is to introduce an industryapplicable as well as financially and environmentally effective solution plasma process. The solution plasma process involves fewer chemicals than the traditional kit, and can be used to replace many of the chemical agents employed in previous synthesis of nanoparticles into plasma. In this study, this process is compared to the wet-reaction process that has thus far been widely used in the most industry. Furthermore, the solution plasma process has been classified into four different types (in-solution, out of solution, direct type, and remote type), according to its plasma occurrence position and plasma types. Thus, the source of radicals, nanoparticle synthesis, and modification methods are explained for each design. Lastly, unlike nanoparticles with hydrophilic functional groups that are made inside the solution, a nanoparticle synthesis and modification method to create a hydrophobic functional group is also proposed.
#Solution Plasma #Nanoparticle #Wet-reduction

Contents

Abstract
Ⅰ. Introduction
Ⅱ. Solution Plasma Process
Ⅲ. Nanoparticle Manufacture and Modification
Ⅳ. Conclusions
References

References (95)

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M. T. Swihart, Current Opinion in Colloid & Interface Science 8, 127 (2003). A. Biswas, Z. Marton, J. Kanzow, J. Kruse, V. Zaporojtchenko, F. Faupel, and T. Strunskus, Nano Letters 3, 69 (2003). J. Okumu, C. Dahmen, A. Sprafke, M. Luysberg, G. Von Plessen, and M. Wuttig, J. Appl. Phys. 97, 094305 (2005). P. Saravanan, M. Premkumar, A. Singh, R. Gopalan, and V. Chandrasekaran, J. Alloys Compounds 480, 645 (2009). M. Adachi, S. Tsukui, and K. Okuyama, Japanese Journal of Applied Physics 42, L77 (2003).

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