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Subject

The effect of UV/O$_3$and HF cleaning on the removal of metallic impurity and on the gate-oxide properties
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$UV/O_3$과 HF 세정이 금속불순물 제거와 gate 산화막 특성에 미치는 영향

논문 기본 정보

Type
Proceeding
Author
이원준 (한양대학교 금속공학과) 전형탁 (한양대학교 금속공학과)
Journal
Materials Research Society Of Korea 한국재료학회 학술발표대회 한국재료학회 1996년도 재료학회 춘계학술발표회
Published
1996.1
Pages
75 - 75 (1page)

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The effect of UV/O$_3$and HF cleaning on the removal of metallic impurity and on the gate-oxide properties
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