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논문 기본 정보

자료유형
학술저널
저자정보
David Mele (Institute of Electronics Microelectronics and Nanotechnology) Sarah Mehdhbi (Institute of Electronics Microelectronics and Nanotechnology) Dalal Fadil (Institute of Electronics Microelectronics and Nanotechnology) Wei Wei (Institute of Electronics Microelectronics and Nanotechnology) Abdelkarim Ouerghi (Center for Nanoscience and Nanotechnology) Sylvie Lepilliet (Institute of Electronics Microelectronics and Nanotechnology) Henri Happy (Institute of Electronics Microelectronics and Nanotechnology) Emiliano Pallecchi (Institute of Electronics Microelectronics and Nanotechnology)
저널정보
대한금속·재료학회 Electronic Materials Letters Electronic Materials Letters Vol.14 No.2
발행연도
2018.1
수록면
133 - 138 (6page)

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In this paper we present high frequency field effect transistors based on graphene nanoribbons arrays (GNRFETs). Thenanoribbons serve as a channel for the transistors and are fabricated with a process based on e-beam lithography and dryetching of high mobility hydrogen intercalated epitaxial graphene. The widths of the nanoribbons vary from 50 to 20 nm,less than half those measured in previous reports for GNRFETs. Hall measurements reveal that the devices are p-doped, withmobility on the order of 2300 cm2/Vs. From DC characteristics, we find that the maximum ratio IMAX/IMIN is 5 obtained at50 nm ribbons width. The IV characteristics of the GNRFETs are slightly non-linear at high bias without a full saturation. Therefore, despite the aggressive scaling of the graphene nanoribbon width, a bandgap is still not observed in our measurements. The high frequency performances of our GNRFETs are already significant at low bias. At 300 mV drain sourcevoltage, the highest intrinsic (extrinsic) cut-off frequency ftreaches 82 (18) GHz and the extrinsic maximum oscillationfrequency fmaxis 20 GHz, which is promising for low power applications.

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