목차

Contents
Contents ···························································································i
Contents of Table ··············································································iii
Contents of Figure ·············································································iv
1.Introduction ··················································································1
1.1. Plasma ··················································································1
1.2. Inductively coupled plasma (ICP) ················································7
1.3. Plasma fluid simulation ·····························································11
2.N2/NH3/SiH4 ICP simulation ······························································16
2.1. Motivation ············································································16
2.2. Simulation conditions ·······························································18
2.2.1. Modeling geometry & variables ············································18
2.2.2. Chemical reactions & surface reactions ···································20
2.3. Simulation results····································································28
2.3.1. Pressure dependencies························································28
2.3.2. Gas mixture ratio dependencies·············································44
2.3.3. Dual power driven for improving uniformity·····························52
2.4. Conclusion············································································55
3.Effects of pulse modulation operation in Ar/H2 ICP ·································56
3.1. Motivation ···········································································56
3.2. Simulation conditions ······························································58
3.2.1. Modeling geometry & variables ············································58
3.2.2. Chemical reactions & surface reactions ···································60
3.3. Simulation results ···································································63
3.3.1. Gas mixture ratio dependencies ·············································63
3.3.2. Duty cycle & pulse frequency dependencies ······························75
3.4. Conclusion ···········································································81
4. Neutral gas temperature in Ar/H2 ICP ···················································82
4.1. Motivation ···········································································82
4.2. Simulation conditions ······························································83
4.3. Simulation results ···································································84
4.4. Conclusion ···········································································90