Investigation on Etch Characteristics of FePt Magnetic Thin Films Using a CH4/Ar Plasma

Eun Ho Kim ,  Hwa Won Lee ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

The Influence of O₂ Gas on the Etch Characteristics of FePt Thin Films in CH₄/O₂/Ar gas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

Effects of Etch Parameters on Etching of CoFeB Thin Films in CH₄/O₂/Ar Mix

Tea Young Lee ,  Il Hoon Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a CH₄/Ar Plasma

Hwa Won Lee ,  Eun Ho Kim ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar

Y. B. Xiao ,  E. H. Kim ,  S .M. Kong 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

ETCHING CHARACTERISTICS OF MAGNETIC THIN FILMS BY ION BEAM TECHNIQUE

H. C. Lee ,  S. D. Kim ,  S. H. Lim 외 3명

한국자기학회지

1995 .10

Satistical Analysis of SiO₂ Contact Hole Etching in a Magnetically Enhanced Reactive Ion Etching Reactor

Chunli Liu ,  B. Sh ,  aune

Journal of Magnetics

2010 .09

Inductively Coupled Plasma Reactive Ion Etching of Nanometer-Patterned Magnetic Tunnel Junction Stack for STT-MRAM

Y. B. Xiao ,  E. H. Kim ,  C. W. Chung

한국자기학회 학술연구발표회 논문개요집

2010 .12

Numerical modeling of Si/SiO₂ etching with inductively coupled CF4 plasma

양원균 ,  주정훈

한국진공학회 학술발표회초록집

2010 .08

Etching Characteristics of Au Film using Capacitively Coupled CF4/Ar Plasma

Kim ,  Gwang-Beom ,  Hong 외 1명

동굴

2007 .01

C₃F₆O 가스를 이용한 SiO₂에 대한 식각 특성 분석

김선웅 ,  양경채 ,  이호석 외 2명

한국진공학회 학술발표회초록집

2017 .08

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Etching characteristics of Ta and TaN using Cl2 / Ar inductively coupled plasma

M. H. Shin ,  S. W. Na ,  N.-E. Lee 외 1명

한국진공학회 학술발표회초록집

2004 .08

Study on etching-shape of ZnO Film by wet-chemical etching

Dong Geun Yoo ,  Myoung Hwa Kim ,  Seong Hun Jeong 외 1명

한국진공학회 학술발표회초록집

2007 .08

Silicon oxide etching studies in inductively coupled fluorocarbon plasmas

Won-Seok Chang ,  Deuk-Chul Kwon ,  Mi-Young Song 외 7명

한국진공학회 학술발표회초록집

2017 .02

Etch Characteristics of MgO Thin Films in Cl2/Ar, CH3OH/Ar, and CH4/Ar Plasmas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2013 .02

Selective Etching of Magnetic Layer Using CO/NH₃ in an ICP Etching System

J. Y. Pa ,  k ,  S.-K Kang 외 2명

한국진공학회 학술발표회초록집

2010 .02

Applications of fluid based plasma simulation : dry etch

주정훈

한국진공학회 학술발표회초록집

2018 .02