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논문 기본 정보

자료유형
학술저널
저자정보
Do Yeon Lee (Seoul National University of Science and Technology) Soo Jung Baek (Seoul National University of Science and Technology) Sung Yeon Ryu (Seoul National University of Science and Technology) Byung Joon Choi (Seoul National University of Science and Technology)
저널정보
한국신뢰성학회 신뢰성응용연구 신뢰성응용연구 제16권 제1호
발행연도
2016.3
수록면
1 - 6 (6page)

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초록· 키워드

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Purpose: Fluorine doped tin oxide (FTO) bottom electrode for Ta₂O<SUB>5</SUB> based RRAM was studied to apply for transparent resistive switching memory devices owing to its superior transparency, good conductivity and chemical stability.
Methods: ITO/Ta₂O<SUB>5</SUB>/FTO (ITF) and ITO/Ta₂O<SUB>5</SUB>/Pt (ITP) devices were fabricated on glass and Si substrate, respectively. UV-visible (UV-VIS) spectroscopy was used to examine transparency of the ITF device and its band gap energy was determined by conventional Tauc plot. Electrical properties, such as electroforming and voltage-induced RS characteristics were measured and compared.
Results: The device with an FTO bottom electrode showed good transparency (>80%), low forming voltage (~-2.5V), and reliable bipolar RS behavior. Whereas, the one with Pt electrode showed both bipolar and unipolar RS behaviors unstably with large forming voltage (~-6.5V).
Conclusion: Transparent and conducting FTO can successfully realize a transparent RRAM device. It is concluded that FTO electrode may form a stable interface with Ta₂O<SUB>5</SUB> switching layer and plays as oxygen ion reservoir to supply oxygen vacancies, which eventually facilitates a stable operation of RRAM device.

목차

1. Introduction
2. Experimental Procedure
3. Results and Discussion
4. Conclusion
References

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UCI(KEPA) : I410-ECN-0101-2016-323-002731187