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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제6권 제4호
- 발행연도
- 2005.1
- 수록면
- 135 - 139 (5page)
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초록· 키워드
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In this paper, negative SU-8 photoresist processed at low temperature is characterized in terms of delamination. Based on a 33 factorial designed experiment, 27 samples are fabricated, and the degree of delamination is measured for each. In addition, nine samples are fabricated for the purpose of verification. Employing the neural network modeling technique, a process model is established, and response surfaces are generated to investigate degree of delamination associated with three process parameters: post exposure bake (PEB) temperature, PEB time, and exposure energy. From the response surfaces generated, two significant parameters associated with delamination are identified, and their effects on delamination are analyzed. Higher PEB temperature at a fixed PEB time results in a greater degree of delamination. In addition, a higher dose of exposure energy lowers the temperature at which the delamination begins and also results in a larger degree of delamination. These results identify acceptable ranges of the three process variables to avoid delamination of SU-8 film, which in turn might lead to potential defects in MEMS device fabrication.
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참고문헌 (10)
참고문헌 신청
/ 1978. / Statistics for Experimenters
/ 1997. / negative tone near-UV photoresist for MSMS applications Tenth Anuual Internaltional Workshop in Micro Eletro Mechani-cal Systems : 518 ~
/ 1998. / Taguchi optimization for the processing of Epon SU-8 resist The eleventh Annual International Workshop on Micro Eelectro Mechanical Systems : 25 ~
/ 2001. / Characteri-zation of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems 20 : 693 ~
/ 2002. / Thick photoresist development for the fabrication of high aspect ratio magnetic coils 12 : 444 ~
/ 1997. / negative tone near-UV photoresist for MSMS applications Tenth Anuual Internaltional Workshop in Micro Eletro Mechani-cal Systems : 518 ~
/ 1998. / Taguchi optimization for the processing of Epon SU-8 resist The eleventh Annual International Workshop on Micro Eelectro Mechanical Systems : 25 ~
/ 2001. / Characteri-zation of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems 20 : 693 ~
/ 2002. / Thick photoresist development for the fabrication of high aspect ratio magnetic coils 12 : 444 ~
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