반도체 웨이퍼 제조공정 클린룸 구조, 공기조화 및 오염제어시스템

최광민; 이지은; 조귀영; 김관식; 조수헌

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자료유형: 학술저널

저자정보: 최광민 (삼성전자 건강연구소) 이지은 (삼성전자 건강연구소) 조귀영 (삼성전자 분석기술팀) 김관식 (삼성전자 보건관리팀) 조수헌 (삼성전자 건강연구소)

저널정보: 한국산업보건학회 (구 한국산업위생학회) 한국산업보건학회지 한국산업보건학회지 제25권 제2호

발행연도: 2015

수록면: 202 - 210 (9page)

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연구주제

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연구배경

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연구방법

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연구결과

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Objectives: The purpose of this study was to examine clean room(C/R) structure, air conditioning and contamination control systems and to provide basic information for identifying a correlation between the semiconductor work environment and workers' disease. Methods: This study was conducted at 200 mm and 300 mm semiconductor wafer fabrication facilities. The C/R structure and air conditioning method were investigated using basic engineering data from documentation for C/R construction. Furthermore, contamination parameters such as airborne particles, temperature, humidity, acids, ammonia, organic compounds, and vibration in the C/R were based on the International Technology Roadmap for Semiconductors(ITRS). The properties of contamination control systems and the current status of monitoring of various contaminants in the C/R were investigated. Results: 200 mm and 300 mm wafer fabrication facilities were divided into fab(C/R) and sub fab(Plenum), and fab, clean sub fab and facility sub fab, respectively. Fresh air(FA) is supplied in the plenum or clean sub fab by the outdoor air handling unit system which purifies outdoor air. FA supply or contaminated indoor air ventilation rates in the 200 mm and 300 mm wafer fabrication facilities are approximately 10-25%. Furthermore, semiconductor clean rooms strictly controlled airborne particles(${\leq}1,000{\sharp}/ft^3$), temperature($23{\pm}0.5^{\circ}C$), humidity($45{\pm}5%$), air velocity(0.4 m/s), air change(60-80 cycles/hr), vibration(${\leq}1cm/s^2$), and differential pressure(atmospheric pressure$+1.0-2.5mmH_2O$) through air handling and contamination control systems. In addition, acids, alkali and ozone are managed at less than internal criteria by chemical filters. Conclusions: Semiconductor clean rooms can be a pleasant environment for workers as well as semiconductor devices. However, based on the precautionary principle, it may be necessary to continuously improve semiconductor processes and the work environment.

#air conditioning #clean room structure #contamination control system #semiconductor work environment

참고문헌 (20)

참고문헌 신청

Choi KM / 2013 / Hazard identification of powder generated from a chemical vapor deposition process in the semiconductor manufacturing industry / J Occup Environ Hyg 10(1):D1~D5

Choi KM / 2015 / Identifying the hazard characteristics of powder by-products generated semiconductor fabrication processes / J Occup Environ Hyg 12(2):114~122

최광민 / 2015 / 반도체 작업환경 내 부산물로 생성되는 실리카 입자의 크기, 형상 및 결정 구조 / 한국산업보건학회지 25(1):36~44

Choi KM / 2015 / Exposure characteristics of nanoparticles as process by-products for the semiconductor manufacturing industry / J Occup Environ Hyg

정은교 / 2012 / 반도체 제조 근로자의 극저주파 자기장 노출 평가 / 한국산업보건학회지 22(1):42~51

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