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논문 기본 정보

자료유형
학술저널
저자정보
Hyo-Jung Kim (Sungkyunkwan University) Bo-Hyeon Jeon (Sungkyunkwan University) Jong-Woo Park (Sungkyunkwan University) June-Hwan Kim (Sungkyunkwan University) Soon-Kon Kim (Sungkyunkwan University) Min-Jun Song (Sungkyunkwan University) Pyung-Ho Choi (Sungkyunkwan University) Jung-Min Park (Sungkyunkwan University) Ki-Hwan Kim (Sungkyunkwan University) Jang-Kun Song (Sungkyunkwan University) Byoung-Deog Choi (Sungkyunkwan University)
저널정보
대한전자공학회 JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE Journal of Semiconductor Technology and Science Vol.20 No.5
발행연도
2020.10
수록면
474 - 478 (5page)
DOI
10.5573/JSTS.2020.20.5.474

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초록· 키워드

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In this paper, we introduce a method enabling faster and more innovative analysis of the channel characteristics of amorphous indium-gallium- zinc oxide (a-IGZO) thin film transistors (TFTs) manufactured on flexible substrates through electrical property analysis. The TFTs used in the present evaluation were a-IGZO TFTs with different oxygen flow rates (OFRs), which have been reported on frequently in the past, to confirm the effectiveness of the new evaluation method. The interface characteristics of the IGZO and the insulator were confirmed by density of state (DOS) extraction using photoexcited charge collection spectroscopy (PECCS). Defects of the TFT active layer were confirmed through the capacitance-time (c-t) method. It was confirmed that the smaller the OFR, the smaller the carrier lifetime due to the presence of oxygen vacancies. In conclusion, by obtaining the same results as previously reported physical analyses, the proposed electrical channel characteristics analysis of IGZO TFTs was shown to be a reliable analysis method.

목차

Abstract
I. INTRODUCTION
II. DEVICE STRUCTURE
III. RESULTS AND DISCUSSION
V. CONCLUSIONS
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