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논문 기본 정보

자료유형
학술저널
저자정보
Rohit Sharma (Amity University Uttar Pradesh) Ashish Kumar (CSIR- National Physical Laboratory) Anit Dawar (Inter University Accelerator Centre) Sunil Ojha (Inter-University Accelerator Centre) Ambuj Mishra (Inter University Accelerator Centre) Anshu Goyal (Solid State Physics Laboratory) Radhapiyari Laishram (Solid State Physics Laboratory) V. G. Sathe (UGC-DAE Consortium for Scientific Research) RITU SRIVASTAVA (National Physical Laboratory) Om Prakash Sinha (Amity University Uttar Pradesh)
저널정보
한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제24권 제2호
발행연도
2023.4
수록면
140 - 148 (9page)
DOI
https://doi.org/10.1007/s42341-023-00429-9

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Field effect transistors (FETs) are considered as the backbone of electronic industry. In this study, we adopted a simple drop cast method for the fabrication of MoS2 and WS2 channel based FET on commercially available pre-patterned OFET devices. The synthesis of few-layers thick MoS2 and WS2 nanosheets (NSs) has been done by solvent-assisted exfoliation method. FESEM and TEM study reveals that NSs have lateral dimensions in micron and have polycrystalline nature. From XPS, it is observed that MoS2 NSs has 2H phase whereas WS2 have hybrid 1T and 2H phase. The frequency difference in Raman vibrational mode for MoS2 and WS2 NSs is 24.08 cm-1 and 63.84 cm-1 respectively, confirms that number of layers is reduced after sonication. UV-visible spectroscopy reveals that the bandgap is 1.7 eV and 1.8 eV for MoS2 and WS2 NSs respectively. Later, these nanosheets have been drop-casted as the channel material on pre-patterned FETs devices and their output and transfer characteristics have been studied. It found that the current On/Off ratio is 10 4 and 10 3 for MoS 2 and WS2-FET device respectively. This facile fabrication of FET devices may provide a new stage for researchers who do not have access of lithography facilities for FET fabrication.

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