Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Brief Review of Atomic Layer Etching Based on Radiofrequency-Biased Ar/C₄F₆-Mixture-Based Inductively Coupled Plasma Characteristics

Min Young Yoon ,  Hee Jung Yeom ,  Jong-Ryul Jeong 외 2명

Applied Science and Convergence Technology

2023 .03

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas

홍영훈 ,  김주호 ,  이무현 외 2명

한국진공학회 학술발표회초록집

2020 .08

Interpretation of current decrease during E - H mode transition in a cylindrical inductively coupled plasma

Jun-Hyeon Moon ,  Ho-Jun Moon ,  Chin-Wook Chung

한국진공학회 학술발표회초록집

2018 .08

Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas

김희주 ,  김교운 ,  홍종우 외 2명

한국진공학회 학술발표회초록집

2020 .08

Silicon oxide etching studies in inductively coupled fluorocarbon plasmas

Won-Seok Chang ,  Deuk-Chul Kwon ,  Mi-Young Song 외 7명

한국진공학회 학술발표회초록집

2017 .02

Research on parallelization mechanism of inductively coupled plasma for large area plasma source

이장재 ,  김시준 ,  김광기 외 5명

한국진공학회 학술발표회초록집

2016 .02

Thermal Atomic Layer Etching of Al₂O₃ Using Ligand Exchange with CF₄ and NF₃ Inductively Coupled Plasmas

Jihyun Kim ,  Yongjae Kim ,  Dahee Shim 외 1명

한국진공학회 학술발표회초록집

2021 .02

Electrical Characteristics of Inductively Coupled Plasma Sources using Magnetic Resonance Wireless Power Transmission System

Ju-Ho Kim ,  Chin-Wook Chung

한국진공학회 학술발표회초록집

2020 .08

Study on the Etching properties by using Inductively Coupled CF₄/C₄F8/O₂ & CF₄/CBr₂F₂/O₂ plasmas

Yunho Nam ,  Junmyung Lee ,  Jongchan Lee 외 1명

한국진공학회 학술발표회초록집

2019 .08

Charterization of large-area N₂/NH₃/SiH₄ inductively coupled plasma using fluid simulation

서권상 ,  김동현 ,  이호준

한국진공학회 학술발표회초록집

2017 .02

C₃F₆O 가스를 이용한 SiO₂에 대한 식각 특성 분석

김선웅 ,  양경채 ,  이호석 외 2명

한국진공학회 학술발표회초록집

2017 .08

Effects of pulsed inductively coupled Cl₂/Ar plasma for the etching of Si nanostructure

신예지 ,  김교운 ,  김희주 외 4명

한국진공학회 학술발표회초록집

2020 .02

Oxide 및 Nitride 고선택비 식각 공정에서의 CF4(CHF3)/O2/Ar inductively coupled pulsed plasmas

김희주 ,  신예지 ,  김교운 외 4명

한국진공학회 학술발표회초록집

2020 .02

Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation

차주홍 ,  한문기 ,  김동현 외 2명

한국진공학회 학술발표회초록집

2015 .08

Characteristics of SiO₂ Etching in a C4F8/Ar/O₂ pulse modulation capacitively coupled plasma

조철희 ,  김시준 ,  이장재 외 4명

한국진공학회 학술발표회초록집

2018 .02

Study on the electrical and optical diagnosis of electron temperatures according to conditions of plasma emission light intensity in inductively coupled plasma

Ye-Seul LEE ,  Jin-Woo CHOI ,  Tae-Hoon JO 외 3명

한국진공학회 학술발표회초록집

2016 .08

Experimental investigation on the plasma generation efficiency and plasma parameters in inductively coupled plasmas with a serial and a parallel antenna

김태우 ,  강현주 ,  정진욱

한국진공학회 학술발표회초록집

2017 .08

Elemental analysis of rice using laser ablation inductively coupled plasma mass spectrometry(LA-ICP-MS)

Seyeon kim ,  Sung-Youn Kim ,  Dong-jin Kang 외 4명

한국분석과학회 학술대회

2022 .11