Effects of Thermal Contact Resistance on Film Growth Rate in a Horizontal MOCVD Reactor

Ik-Tae Im; Nag Jung Choi; Masakazu Sugiyama; Yukihiro Shimogaki; Byoung Ho Kim; Kwang-Sun Kim

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자료유형: 학술저널

저자정보: Ik-Tae Im Nag Jung Choi Masakazu Sugiyama Yukihiro Shimogaki Byoung Ho Kim Kwang-Sun Kim

저널정보: 대한기계학회 Journal of Mechanical Science and Technology Journal of Mechanical Science and Technology Vol.19 No.6

발행연도: 2005.6

수록면: 1,338 - 1,346 (9page)

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Effects of thermal contact resistance between heater and susceptor, susceptor and graphite board in a MOCVD reactor on temperature distribution and film growth rate were analyzed. One-dimensional thermal resistance model considering thermal contact resistance and heat transfer area was made up at first to find the temperature drop at the surface of graphite board. This one-dimensional model predicted the temperature drop of 18K at the board surface. Temperature distribution of a reactor wall from the three-dimensional computational fluid dynamics analysis including the gap at the wafer position showed the temperature drop of 20K. Film growth rates of InP and GaAs were predicted using computational fluid dynamics technique with chemical reaction model. Temperature distribution from the three-dimensional heat transfer calculation was used as a thermal boundary condition to the film growth rate simulations. Temperature drop due to the thermal contact resistance affected to the GaAs film growth a little but not to the InP film growth.

참고문헌 (17)

참고문헌 신청

FLUENT is a Product of Fluent lnc., 2003, 10, Cavendish Court, Lebanon, NH, USA.

Feron, O., Sugiyama, M., Aswamethapant, W., Futakuchi, N., Feurprier, Y., Nakano, Y. and Shimogaki, Y., 2000, "MOCVD of 1nGaAsP, InGaAs, InGaP over 1nP and GaAs Substrates : Distribution of Composition and Growth rate in a Horizontal Reactor," Appl. Surf.

Im, I. -T., Oh, H. J., Sugiyama, M., Nakano, Y. and Shimogaki, Y., 2004, "Fundamental Kinetics Determining Growth Rate Profiles of InP and GaAs in MOCVD with Horizontal Reactor," J. of Crystal Growth, Vol.261, pp.214~224.

KJeijn, C. R., 1994, Chap. 4 in Computational Modeling in Semiconductor Processing, Meyyappan, M. ed., Artech House, Boston.

Lum, R. M., Mcdonald, M. L., Mack, E. M., Williams, M. D., Storez, F. G. and Levkoff, J., 1995, "Effect of Temperature on InGaAsP Alloy Composition," J. of Electronic Materials, Vol.24, No.11, pp.1577~1581.

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주요연구분야 공학 > 기계공학 > 기계공학 일반 공학 > 공학 일반

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Nag Jung Choi

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