Comparison of etching characteristics of ArF and EUV photoresists in dual-frequency superimposed capacitively coupled plasmas (DFS-CCP)

B. S. Kwon ,  H. W. Kim ,  H. J. Lee 외 3명

한국진공학회 학술발표회초록집

2008 .02

Selective etching of SiO₂ using embedded RF pulsing in a dual-frequency capacitively coupled plasma system

염원균 ,  전민환 ,  김경남 외 1명

한국진공학회 학술발표회초록집

2015 .08

Role of gas flow rate during etching of hard-mask layer to extreme ultra-violet resist in dual-frequency capacitively coupled plasmas

권봉수 ,  이정훈 ,  이내응

한국진공학회 학술발표회초록집

2010 .08

Power Dissipation in a RF Capacitively Coupled Plasma

T. H. T ,  an ,  S. J. You 외 3명

한국진공학회 학술발표회초록집

2013 .02

Dual-frequency Capacitively Coupled Plasma-enhanced Chemical Vapor Deposition System for Solar Cell Manufacturing

권형철 ,  원임희 ,  신현국 외 3명

한국진공학회 학술발표회초록집

2011 .08

Control of spatial distribution of plasma density by the variable capacitor in a capacitively coupled plasma

Ho-Jun Moon ,  Chin-Wook Chung

한국진공학회 학술발표회초록집

2018 .08

Role of CH2F2 and N-2 Flow Rates on the Etch Characteristics of Dielectric Hard-mask Layer to Extreme Ultra-violet Resist Pattern in CH2F2/N2/Ar Capacitively Coupled Plasmas

B. S. Kwon ,  J. H. Lee ,  N. E. Lee

한국진공학회 학술발표회초록집

2011 .02

Characteristics of Internal Linear Inductively Coupled Plasma Source Operated with Superimposed Dual Frequency

김도한 ,  지유진 ,  김태형 외 4명

한국진공학회 학술발표회초록집

2017 .02

Highly selective etching of silicon nitride to CVD a-C in dual-frequency capacitively coupled CH₂F₂/H₂plasmas

김진성 ,  권봉수 ,  안정호 외 6명

한국진공학회 학술발표회초록집

2009 .08

Effect of high - frequency variation on ArF PR deformation and silicon nitride etching by dual frequency superimposed (DFS rf capacitive coupled plasma

N. E. Lee ,  D. H. Kim

한국진공학회 학술발표회초록집

2004 .08

Characteristics of Inductively Coupled Plasma Source Using Internal Linear Antenna Operated by Superimposed Dual Frequency

이수정 ,  김도한 ,  김태형 외 1명

한국진공학회 학술발표회초록집

2017 .08

Plasma Etching of Parylene and SU-8 Polymer in Capacitively Coupled O₂ Plasma

Jewon Lee ,  Sanghyeok Pa ,  k 외 7명

한국진공학회 학술발표회초록집

2019 .08

Etching characteristics of ArF and EUV resists in dual-frequency superimposed capacitively coupled CF₄/O₂/Ar and CF₄/CHF₃/O₂/Ar plasmas

권봉수 ,  박영록 ,  김진성 외 4명

한국진공학회 학술발표회초록집

2008 .08

Initial Study of Electron Temperature and Density Simulation on Capacitively Coupled RF He Plasma

Deokho Hwang ,  Sanghyeok Pa ,  k 외 7명

한국진공학회 학술발표회초록집

2019 .08

Mechanism of infinite Si₃N₄/ArF PR etch selectivity during CH₂F₂/H₂/Ar dual frequency capacitively coupled plasma etching of Si3N4 layers

박창기 ,  김희대 ,  이춘희 외 1명

한국진공학회 학술발표회초록집

2006 .08

Role of N₂ flow rate on etch characteristics and variation of line edge roughness during etching of silicon nitride with extreme ultra-violet resist pattern in dual-frequency CH₂F₂/N₂/Ar capacitively coupled plasmas

권봉수 ,  정창룡 ,  이내응 외 1명

한국진공학회 학술발표회초록집

2010 .02

Microtrenching of SiO₂ contact hole etching in C₄F₈/Ar capacitively coupled plasma

S. J. Kim ,  J. J. Lee ,  H. J. Yeom 외 2명

한국진공학회 학술발표회초록집

2017 .08

Effects of CH₂F₂ and H₂ flow rates on process window for infinite etch selectivity of silicon nitride to PVD a-C in dual-frequency capacitively coupled plasmas

김진성 ,  권봉수 ,  안정호 외 2명

한국진공학회 학술발표회초록집

2009 .02

Characteristics of SiO₂ Etching in a C4F8/Ar/O₂ pulse modulation capacitively coupled plasma

조철희 ,  김시준 ,  이장재 외 4명

한국진공학회 학술발표회초록집

2018 .02

Etching Characteristics of Au Film using Capacitively Coupled CF4/Ar Plasma

Kim ,  Gwang-Beom ,  Hong 외 1명

동굴

2007 .01