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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.25 No.4
- 발행연도
- 2016.7
- 수록면
- 73 - 76 (4page)
이용수
초록· 키워드
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Multi-layer films of SiN<SUB>x</SUB>/SiO<SUB>x</SUB>/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of SiN<SUB>x</SUB>/SiO<SUB>x</SUB>/InSnO was investigated as a function of ratio of SiN<SUB>x</SUB> and SiO<SUB>x</SUB> thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.
목차
Abstract
Ⅰ. Introduction
Ⅱ. Experiment
Ⅲ. Result and DiscusSiOn
Ⅳ. Conclusions
References
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UCI(KEPA) : I410-ECN-0101-2019-420-001276145