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Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes
한국진공학회 학술발표회초록집
2020 .02
Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes
한국진공학회 학술발표회초록집
2020 .02
Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride
한국진공학회 학술발표회초록집
2020 .08
Correlation Analysis of Plasma Optical Emission Spectra and Silicon Nitride Films Deposited in Inductively Coupled Plasmas
한국진공학회 학술발표회초록집
2021 .02
Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source
Applied Science and Convergence Technology
2016 .07
Low Temperature PECVD process for SiNx/Organic Multilayer Thin Film Encapsulation
한국진공학회 학술발표회초록집
2017 .02
VHF-PECVD for a-Si:H and a-SiN:H Film Deposition
Applied Science and Convergence Technology
2019 .09
Spectroscopic Analysis of Effects of Additive Nitrogen on Atmospheric Pressure Ar/HMDS Plasma
Applied Science and Convergence Technology
2023 .09
저온 선형 PECVD를 이용한 OLED용 Encapsulation 특성 연구
한국진공학회 학술발표회초록집
2016 .02
Double antireflection thin film by plasma enhanced chemical vapor deposition for silicon solar cell
한국진공학회 학술발표회초록집
2016 .08
Silicon Thin-film Solar Cell Deposited by Using High Working Pressure Plasma-enhanced Chemical Vapor Deposition System
한국진공학회 학술발표회초록집
2015 .02
A Brief Review of Plasma Enhanced Atomic Layer Deposition of Si₃N₄
Applied Science and Convergence Technology
2019 .09
Photosensor based on ReS2 film synthesized by chemical vapor deposition
한국진공학회 학술발표회초록집
2020 .02
Plasma nitridation of atomic layer deposition-Al2O3 by NH3 in PECVD
한국진공학회 학술발표회초록집
2016 .02
Silicon nitride deposition for flexible organic electronic devices by very high frequency plasma enhanced chemical vapor deposition using a multi-tile push-pull plasma source
한국진공학회 학술발표회초록집
2017 .02
Effect of plasma properties on characteristics of silicon nitride film deposited by PECVD process at low temperature
한국진공학회 학술발표회초록집
2016 .08
Enhancement of the Virtual Metrology Performance for Plasma-assisted Processes by Using Plasma Information (PI) Parameters
한국진공학회 학술발표회초록집
2015 .08
Realization of efficient barrier performance of a silicon nitride film simply via plasma chemistry
한국진공학회 학술발표회초록집
2017 .02
낮은 GWP를 가진 CxF2xO 을 이용한 SiO2 식각 공정 특성에 관한 연구
한국진공학회 학술발표회초록집
2020 .02
Plasma enhanced atomic layer deposition of silicon nitride using a VHF (162 MHz) plasma source
한국진공학회 학술발표회초록집
2020 .02
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