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논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 발행연도
- 2021.2
- 수록면
- 101 - 101 (1page)
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이 논문의 연구 히스토리 (3)
2020
Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride
Seunghun Han
,
Byung hyun Oh
,
Heeyeop Chae
한국진공학회 학술발표회초록집
2020.08
학술대회자료
Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes
Seunghun Han
,
Sun Jung Kim
,
Heeyeop Chae
한국진공학회 학술발표회초록집
2020.02
학술대회자료
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초록· 키워드
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In this work, the relationship between plasma characterization and film qualities was analyzed in plasma enhanced chemical vapor deposition (PECVD) using optical emission spectroscopy (OES). The line ratios of N2+/N2 is known to reflect the plasma physical states and other OES signals was relate ... 전체 초록 보기
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Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes
한국진공학회 학술발표회초록집
2020 .02
-
Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes
한국진공학회 학술발표회초록집
2020 .02
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Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride
한국진공학회 학술발표회초록집
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Plasma Optical Signal Analysis for SiNx Plasma Enhanced Chemical Vapor Deposition Processes
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VHF-PECVD for a-Si:H and a-SiN:H Film Deposition
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Effect of plasma properties on characteristics of silicon nitride film deposited by PECVD process at low temperature
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Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source
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Plasma enhanced atomic layer deposition of silicon nitride using a VHF (162 MHz) plasma source
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2020 .02
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Realization of efficient barrier performance of a silicon nitride film simply via plasma chemistry
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Double antireflection thin film by plasma enhanced chemical vapor deposition for silicon solar cell
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Low Temperature PECVD process for SiNx/Organic Multilayer Thin Film Encapsulation
한국진공학회 학술발표회초록집
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Silicon nitride deposition for flexible organic electronic devices by very high frequency plasma enhanced chemical vapor deposition using a multi-tile push-pull plasma source
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Novel synthesis of nanocrystalline thin films by design and control of deposition energy and plasma
한국진공학회 학술발표회초록집
2016 .02
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Plasma enhanced atomic layer deposition of silicon nitride films using a VHF (162 ㎒) multi-tile push-pull plasma source
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Study on the electrical and optical diagnosis of electron temperatures according to conditions of plasma emission light intensity in inductively coupled plasma
한국진공학회 학술발표회초록집
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Dry etching of Al₂O3 thin films in inductively coupled plasma system
한국진공학회 학술발표회초록집
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Formation of Graphene-Seeds on Silicon Nitride Using Chemical Vapor Deposition
한국진공학회 학술발표회초록집
2015 .02
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Silicon nitride deposition by VHF (162 MHz)-PECVD using a multi-tile push-pull plasma source
한국진공학회 학술발표회초록집
2016 .08
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