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논문 기본 정보

자료유형
학술저널
저자정보
Qi-Ming Chen (Guangdong University) Jin-Yun Zhou (Guangdong University) Yi-Ming Hu (Guangdong University) Qi Zheng (Guangdong University)
저널정보
한국바이오칩학회 BioChip Journal BioChip Journal Vol.14 No.4
발행연도
2020.1
수록면
369 - 380 (12page)

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A method involving multi-exposure with low-power is presented to fabricate an SU-8 mold based on a digital micromirror device (DMD) maskless lithography with an LED source at a wavelength of 405 nm. The SU-8 mold is used for the fabrication of a PDMS concentration gradient generator (CGG). During a one-time exposure, it is easy to over-expose at the top and under-expose at the bottom of a thick SU-8, which then forms a T-shaped structure. This is more obvious for high-absorption coefficients such as 365 nm. We found that by taking advantage of the partially absorbed and partially transmissive characteristics of the 405-nm wavelength, multi-exposure can form an effective photochemical reaction channel in SU-8 and can solve the problem mentioned above. However, excessive exposure will cause the linewidth to increase, therefore, it is necessary to find a tradeoff for the number of multi-exposure times. For a 55-μm thick SU-8, the tradeoff threshold is found to be 25. Three types of SU-8 CGG molds were fabricated at this threshold. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-shaped structures.

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