Plasma enhanced atomic layer deposition of silicon nitride films using a VHF (162 ㎒) multi-tile push-pull plasma source

You Jin Ji ,  Ki Hyun Kim ,  Ki Seok Kim 외 5명

한국진공학회 학술발표회초록집

2020 .08

초고주파 (162 MHz) 다중 분할 전극 플라즈마 소스를 이용한 silicon nitride PEALD 공정연구

지유진 ,  김기석 ,  김기현 외 5명

한국진공학회 학술발표회초록집

2019 .08

Pure Cobalt Thin Film by using Very High frequency (60MHz) Plasma-Enhanced Atomic Layer Deposition

Chang Hoon Song ,  Won Kyun Yeom ,  Doo San Kim 외 3명

한국진공학회 학술발표회초록집

2018 .08

Silicon nitride deposition by VHF (162 MHz)-PECVD using a multi-tile push-pull plasma source

Ki Seok KIM ,  Albe ,  t Roge 외 2명

한국진공학회 학술발표회초록집

2016 .08

VHF-PECVD for a-Si:H and a-SiN:H Film Deposition

Jin Seok Kim

Applied Science and Convergence Technology

2019 .09

Characteristics of low temperature cobalt thins films deposited by VHF PEALD (60 and 100 MHz)

Won Kyun Yeom ,  Chang Hoon Song ,  Geun Young Yeom

한국진공학회 학술발표회초록집

2020 .02

Nitriding process for semiconductor devices by using a multi-electrode VHF (162 MHz) plasma source

지유진 ,  김기석 ,  김기현 외 6명

한국진공학회 학술발표회초록집

2018 .08

Silicon nitride deposition for flexible organic electronic devices by very high frequency plasma enhanced chemical vapor deposition using a multi-tile push-pull plasma source

지유진 ,  김기석 ,  김기현 외 3명

한국진공학회 학술발표회초록집

2017 .02

Plasma-enhanced atomic layer deposition of silicon nitride thin films using bis(diethylamino)silane

Jae-Min PARK ,  Yong-Ho NOH ,  June HWANG 외 1명

한국진공학회 학술발표회초록집

2016 .08

Properties of cobalt thin films deposited by PEALD using very high frequency (60 and 100 MHz)

박준모 ,  염원균 ,  송창훈 외 1명

한국진공학회 학술발표회초록집

2019 .08

A Brief Review of Plasma Enhanced Atomic Layer Deposition of Si₃N₄

You Jin Ji ,  Ki Seok Kim ,  Ki Hyun Kim 외 2명

Applied Science and Convergence Technology

2019 .09

Reactions between silicon precursors and surface sites during atomic layer deposition of silicon nitride

Luchana L. YUSUP ,  Jae-Min PARK ,  Ti 외 5명

한국진공학회 학술발표회초록집

2016 .08

Characteristic analysis of HfO2 thin films deposited at low-temperature using direct plasma-enhanced atomic layer deposition

김경문 ,  윤순길 ,  정낙관

한국진공학회 학술발표회초록집

2020 .02

Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride

Seunghun Han ,  Byung hyun Oh ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .08

고주파 (162 MHz) 분할전극 플라즈마 소스를 이용한 저수소 함량의 Silicon nitride (SiNx) 박막증착 및 PEALD 공정에 관한 연구

이승엽 ,  변지영 ,  김기석 외 3명

한국진공학회 학술발표회초록집

2019 .08

Synthesis and Characterization of SnO2 Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition Using SnCl4 Precursor and Oxygen Plasma

이동권 ,  김다영 ,  권세훈

한국진공학회 학술발표회초록집

2016 .02

Plasma Optical Signal Analysis for SiNx Plasma Enhanced Chemical Vapor Deposition Processes

Yooncheol Shin ,  Sun Jung Kim ,  Sangin Lee 외 1명

한국진공학회 학술발표회초록집

2019 .08

Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes

Seunghun Han ,  Sun Jung Kim ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes

Sun Jung Kim ,  Seunghun Han ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Effects of Redeposition on Low-Temperature Plasma Enhanced-Atomic Layer Deposition of Silicon Nitride Thin films for the Encapsulation layer of flexible OLEDs

김지민 ,  김성민 ,  김형준

한국진공학회 학술발표회초록집

2018 .02