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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국재료학회 Fabrication and Characterization of Advanced Materials Fabrication and Characterization of Advanced Materials 제2권 제4호
- 발행연도
- 1995.1
- 수록면
- 625 - 630 (6page)
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초록· 키워드
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Carbon nitride thin films were depositied by R.F. magnetron sputtering of a graphite targen under a nitrogen ambient noto Si(100) substrated at various negative bias. The films were analyzed using Raman spectroscopy, FTIR, XPS and AFM. The films contained about 80% carbon and 20% nitrogen. Raman spectra showed that the degree of the discorder increased with negative bias. FTIR and XPS studies indicated that nitrogen atoms in the film were chemically bonded to carbon atoms. The shifts in binding energy of Cls and Nls photoelectrons occurred due to electronic charge transfer from C atom to N atom. The surface morphology of the film was very smooth at low negative bias but at high negative bias there was serious damage by re-sputtering
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