Silicon nitride deposition for flexible organic electronic devices by very high frequency plasma enhanced chemical vapor deposition using a multi-tile push-pull plasma source

지유진 ,  김기석 ,  김기현 외 3명

한국진공학회 학술발표회초록집

2017 .02

Plasma enhanced atomic layer deposition of silicon nitride films using a VHF (162 ㎒) multi-tile push-pull plasma source

You Jin Ji ,  Ki Hyun Kim ,  Ki Seok Kim 외 5명

한국진공학회 학술발표회초록집

2020 .08

Plasma enhanced atomic layer deposition of silicon nitride using a VHF (162 MHz) plasma source

You Jin Ji ,  Ki Hyun Kim ,  Ki Seok Kim 외 5명

한국진공학회 학술발표회초록집

2020 .02

VHF-PECVD for a-Si:H and a-SiN:H Film Deposition

Jin Seok Kim

Applied Science and Convergence Technology

2019 .09

Nitriding process for semiconductor devices by using a multi-electrode VHF (162 MHz) plasma source

지유진 ,  김기석 ,  김기현 외 6명

한국진공학회 학술발표회초록집

2018 .08

Effect of plasma properties on characteristics of silicon nitride film deposited by PECVD process at low temperature

Jeon G. HAN ,  Jun S. LEE ,  Bibhuti B. SAHU 외 3명

한국진공학회 학술발표회초록집

2016 .08

Passivation Properties of Hydrogenated Silicon Nitrides deposited by PECVD

Jae Eun Kim ,  Kyung Dong Lee ,  Yoonmook Kang 외 2명

한국진공학회 학술발표회초록집

2016 .02

초고주파 (162 MHz) 다중 분할 전극 플라즈마 소스를 이용한 silicon nitride PEALD 공정연구

지유진 ,  김기석 ,  김기현 외 5명

한국진공학회 학술발표회초록집

2019 .08

Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride

Seunghun Han ,  Byung hyun Oh ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .08

Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes

Seunghun Han ,  Sun Jung Kim ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes

Sun Jung Kim ,  Seunghun Han ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Plasma Optical Signal Analysis for SiNx Plasma Enhanced Chemical Vapor Deposition Processes

Yooncheol Shin ,  Sun Jung Kim ,  Sangin Lee 외 1명

한국진공학회 학술발표회초록집

2019 .08

Low-temperature PECVD silicon nitride film for the fabrication of capacitance type pressure sensor

Kyeong-Keun CHOI ,  Kee JONG ,  Jeong-Yoon LEE 외 1명

한국진공학회 학술발표회초록집

2016 .08

Synthesis of silicon nitride thin film for high permeation barrier performance with RF power variation on hollow cathode RF PECVD

김석현 ,  이준석 ,  B.B.Sahu 외 1명

한국진공학회 학술발표회초록집

2018 .02

Synthesis of SiNx:H films in PECVD using RF/UHF hybrid sources

K. S. Shin ,  B. B. Sahu ,  J. S. Lee 외 3명

한국진공학회 학술발표회초록집

2015 .08

Low Temperature PECVD process for SiNx/Organic Multilayer Thin Film Encapsulation

Hyung June Ahn ,  Sang Heon Yong ,  Sun Jung Kim 외 3명

한국진공학회 학술발표회초록집

2017 .02

Silicon Thin-film Solar Cell Deposited by Using High Working Pressure Plasma-enhanced Chemical Vapor Deposition System

권정대 ,  남기석 ,  김동호

한국진공학회 학술발표회초록집

2015 .02

Correlation Analysis of Plasma Optical Emission Spectra and Silicon Nitride Films Deposited in Inductively Coupled Plasmas

Seunghun Han ,  Byung hyun Oh ,  Yong soo Lim 외 1명

한국진공학회 학술발표회초록집

2021 .02

Realization of efficient barrier performance of a silicon nitride film simply via plasma chemistry

이준석 ,  Yong Yi Yin ,  B. B. Sahu 외 1명

한국진공학회 학술발표회초록집

2017 .02

Reactions between silicon precursors and surface sites during atomic layer deposition of silicon nitride

Luchana L. YUSUP ,  Jae-Min PARK ,  Ti 외 5명

한국진공학회 학술발표회초록집

2016 .08